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URN etd-0106105-145928 Statistics This thesis had been viewed 3595 times. Download 1446 times. Author Hsien-Yu Yang Author's Email Address 28282081@YAHOO.COM.TW Department Chemical Engineering Year 2004 Semester 1 Degree Master Type of Document Master's Thesis Language English Page Count 71 Title STUDY ON THE SYNTHESIS OF POLYMER WITH TERT-BUTYL GROUP AND THEIR CHARACTERS ON THE CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST Keyword positive photore chemical amplified tert-Butyl tert-Butyl chemical amplified positive photore Abstract In this investigation, monomer with high thermal stability, N-(4-carboxy-phenyl) maleimide (CPMI), was synthesized from the maleic anhydride , ρ-aminobenzic acid. With another monomer, tert-Butyl methacrylate, free radical copolymerization of this two monomer, were performed at 60~70℃ in the presence of azobisisobutyronitrile (AIBN) as an initiator in 12ml tetrahydrofuran (THF).
This photoresist is chemical amplified photoresist, exposured under Deep-UV (248nm) and photo acid generator produce acid proton. During post exposure bake (PEB) process chemical amplified achieved and the photo acid generator (PAG) is 15wt% relative copolymer. Using 20wt% photoresist coated and 1~2μm film thickness obtained. Develop in 0.015wt% Na2CO3 the positive pattern obtained. From exposure curve that chemical amplified photoresist need less exposure dose(825 mJ/cm2) relative traditional photoresist and achieve the effect of exposure.
Advisor Committee Wen-Yen Chiang - advisor
Chi-Uian Huang - co-chair
Zchau-Chion Zchan - co-chair
Files Date of Defense 2005-01-03 Date of Submission 2005-01-06