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Title page for etd-0629104-142431


URN etd-0629104-142431 Statistics This thesis had been viewed 3174 times. Download 1257 times.
Author Ta-Yu Chuang
Author's Email Address super140281@sinamail.com
Department Materials Engineering
Year 2004 Semester 2
Degree Master Type of Document Master's Thesis
Language English Page Count 46
Title The influence of EDM process parameters for silver nanoparticle
Keyword
  • nanosilver particles
  • dielectric liquid temperatures
  • Arc Spray Nanoparticle Synthesis System
  • Arc Spray Nanoparticle Synthesis System
  • dielectric liquid temperatures
  • nanosilver particles
  • Abstract Arc Spray Nanoparticle Synthesis System (ASNSS) have been used to prepare the silver nanofluids in this study. The metal electrodes under the electrical discharge will melt and evaporate rapidly and condense to form the nanoparticles in the dielectric fluid at lower temperature and produce the suspended nanoparticle fluid. Thus, the mechanism of the ASNSS process is superheating the electrodes by plasma to form metallic nuclei and supercooling these nuclei by dielectric liquid to produce nanofluid.
    This study considers the different controlling parameters such as discharge current, discharge voltage, pulse-duration time, electrode diameter, and the temperature of dielectric liquid. The optimal operated parameters can be obtained to produce the finer particle size in nanofluid. The results indicate the silver electrodes in alcohol fluid will produce the sphere nanosilver particles. The mean particle size of silver in different dielectric liquid temperatures of -40℃; -20℃; 0℃; and 10℃ is about 13.4nm, 15.8nm, 17.5nm, and 21.6nm, respectively. This indicates that the well suspended fluid can be obtain by controlling the lower dielectric fluid temperature.
    FTIR results indicate there are no decomposition of alcohol during arc discharge that may contaminate the silver nanofluids. ASNSS process can obtain well suspended pure nanosilver particles in alcohol forming nanofluid. The yield of nanofluid is approximated the commercial applications.
    Advisor Committee
  • Hong-ming Lin - advisor
  • Files indicate access worldwide
    Date of Defense 2004-06-08 Date of Submission 2004-06-29


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