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Title page for etd-0723105-075438


URN etd-0723105-075438 Statistics This thesis had been viewed 1659 times. Download 14 times.
Author Wei-Min Wu
Author's Email Address No Public.
Department Materials Engineering
Year 2004 Semester 2
Degree Master Type of Document Master's Thesis
Language English Page Count 122
Title The Effect of Substrate Types on the Carbon Films Synthesized by RF Plasma Enhanced Chemical Vapor Deposition
Keyword
  • substrate effect
  • PECVD
  • diamond-like carbon films
  • diamond-like carbon films
  • PECVD
  • substrate effect
  • Abstract This research investigated the effect of substrate types on the carbon films synthesized by RF plasma enhanced chemical vapor deposition. Four different substrates, silicon wafer(100), glass, flat polished and mirror polished alumina, were used. The carbon films were deposited using methane atmosphere at four different self-bias voltages ( - 157 V, - 403 V, - 500 V, - 590V) by changing the plasma power under fixed flow rate and working pressure. The result showed that the deposition rate increased with self-bias for all the substrates. In addition, on silicon wafer and glass substrates the film thickness increased with self-bias. The surface morphology and roughness of the films were studied by AFM, and the overall surface morphology of flat and mirror polished alumina were studied by optical microscopy and the overall surface roughness were measured by α-step. The friction coefficient was measured by nanoindentation technique and the result showed that the influence of surface roughness on the friction coefficient becomes smaller as the film thickness increases. Raman analyses indicated that diamond-like carbon films were deposited on silicon and glass substrate at the self-bias – 403 V~ - 590 V, and polymer-like carbon films were obtained at – 157 V. For the alumina substrates, different Raman results were observed for flat and mirror polished alumina substrates. Results of infrared spectrum showed that the amount of C-H bonding decreases as the self-bias increases. The hardness of diamond-like carbon films, deposited on silicon and glass substrates at the self-bias -403 V~ - 590 V, is within 15~ 20 GPa using nanoindentation technique. Finally, the UV-Vis spectroscope was used to measure the optical transmittance of carbon films deposited on glass substrate.
    Advisor Committee
  • Shinn-Shyong Tzeng - advisor
  • none - co-chair
  • none - co-chair
  • Files indicate in-campus access at one year and off-campus not accessible
    Date of Defense 2005-06-22 Date of Submission 2005-07-23


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