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URN etd-0731112-112456 Statistics This thesis had been viewed 1251 times. Download 0 times. Author Yu-Kai Su Author's Email Address No Public. Department Electro-Optical Engineering Year 2011 Semester 2 Degree Master Type of Document Master's Thesis Language zh-TW.Big5 Chinese Page Count 84 Title Deposition of Nickel Oxide/Carbon Nanoflakes on Glass Substrates by RF Magnetron Sputtering for Supercapacitor Application Keyword Carbon Nanoflakes Supercapacitor RF Magnetron Sputtering Nickel Oxide Nickel Oxide RF Magnetron Sputtering Supercapacitor Carbon Nanoflakes Abstract In this study, we fabricated the nickel oxide (NiO) and carbon nanoflakes (CNFs) on glass substrate by radio-frequency magnetron sputtering system. The effects of deposition time, and were studied growth temperature and power supply on the composite film during the sputtering process. The resultant films were surface morphology and composite measured by SEM and XRD to study the structure of the composite films. Additionally, were carried out the cyclic voltammetry measurements to investiaged the electrochemical performance as an electrode for supercapacitor.
In the nano-carbon film process, we found that the specific capacitance values have improved significantly in the change of the growth temperature and deposition time, the experiments under argon mixed hydrogen deposition 80 minutes, the growth temperature of 350 ℃, nano-carbon sheets,its specific capacitance value of the scan rate of 0.01 V/s rate of only nickel oxide film as the electrode material, the specific capacitance value only 10.9 Fg-1, but coupled with nano-carbon sheets composite filmsthan the capacitance value of 65 Fg-1, and then when the scan rate of 0.005 V/s rate, we can get our largest capacitance value of 97.6 Fg-1.
Advisor Committee Wen-Ching Shih - advisor
none - co-chair
none - co-chair
Files Date of Defense 2012-07-17 Date of Submission 2012-07-31