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URN etd-0821109-145753 Statistics This thesis had been viewed 4029 times. Download 1381 times. Author Chen-John Ming Author's Email Address No Public. Department Mechanical Engineering Year 2008 Semester 2 Degree Master Type of Document Master's Thesis Language zh-TW.Big5 Chinese Page Count 80 Title The application of textured surface as antireflection surface on solar cells Keyword Etching. Anti-reflectivity structure Anti-reflectivity Solar cell ；Lift off Solar cell ；Lift off Anti-reflectivity Anti-reflectivity structure Etching. Abstract ABSTRACT
The new process its purpose was to modify the reflectivity of solar cell. That used pattern and etching simply to change the microstructure of the surface in wafer (solar cell). That process reduced the reflectivity when the light lighted the surface of wafer。The light energy was keep in the wafer and the light energy exchange to electro energy increase。The process was to spin coating HMDS to wafer (solar cell), and then attached the photoresists to surface. To exposure and autoradiography the wafer .We got the wafer with pattern and etched the wafer. The open area and line size also changed the reflectivity of wafer. That also was the purpose how to get the best anti-reflectivity.
In this research，the first phase was bare wafer etching，the second phase was pattern wafer etching，the third phase was the comparison and discussion in the bare wafer etching and pattern wafer etching, the fourth phase is discuss the open area and line size, the fifth phase was opportunity of etching. At last, we discussed the result in these phases.
Advisor Committee Wei-Che Hung - advisor
Cheng-Min Hsing - co-chair
Tai-Fong Cheng - co-chair
Files Date of Defense 2009-07-29 Date of Submission 2009-08-24