Announcement for Downloading full text filePlease respect the Copyright Act.
All digital full text dissertation and theses from this website are authorized the copyright owners. These copyrighted full-text dissertation and theses can be only used for academic, research and non-commercial purposes. Users of this website can search, read, and print for personal usage. In respect of the Copyright Act of the Republic of China, please do not reproduce, distribute, change, or edit the content of these dissertations and theses without any permission. Please do not create any work based upon a pre-existing work by reproduction, Adaptation, Distribution or other means.
URN etd-0822113-114848 Statistics This thesis had been viewed 1789 times. Download 447 times. Author Chen-Yu Peng Author's Email Address No Public. Department Mechanical Engineering Year 2012 Semester 2 Degree Master Type of Document Master's Thesis Language zh-TW.Big5 Chinese Page Count 74 Title Showerhead Design Optimization of Metal-Organic Chemical Vapor Deposition in Vertical Reactor Keyword CFD Optimization Differential Evolution MOCVD MOCVD Differential Evolution Optimization CFD Abstract Metal-Organic Chemical Vapor Deposition (MOCVD), presented by an American company named Rockwell Inc. in 1968, is a new technology to form semiconductor crystalline film. The high temperature inside of reactor is used to detonate the chemical reaction of metal-organic and deposit a layer of semiconductor crystalline film from the reactant on substrate. In order to deposit the film more uniformly, the seal、flow rate and temperature of the MODVC equipment needs to be controlled accurately.
The characteristics of global search and fast convergence of differential evolution are implemented in this study as algorithm for optimization. Several test functions are first applied to verify the performance and the correctness of the developed optimization program. Then commercial computer-aided engineering software Ansys Fluent and ICEM CFD are utilized for design of showerhead of MOCVD. The design variables include location and diameter of air vents、the distance between substrate and showerhead. The goal is to gain the uniformity of film deposition. From the results of this study, problems in the development process can be reduced or avoided by integration of differential evolution algorithm with simulation of flow field and thin film deposition. It can increase the yield rate and improve the competitiveness in developing MOCVD facility.
Advisor Committee Chun-Yin Wu - advisor
Chehung Wei - co-chair
Ting-Tung Li - co-chair
Files Date of Defense 2013-07-01 Date of Submission 2013-08-22