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The defense date of the thesis is 2016-08-25
The current date is 2019-05-24
This thesis will be accessible at 2026-08-25
URN etd-0824116-161221 Statistics This thesis had been viewed 504 times. Download 0 times. Author Chi-Wei Meng Author's Email Address No Public. Department Electrical Engineering Year 2015 Semester 2 Degree Master Type of Document Master's Thesis Language zh-TW.Big5 Chinese Page Count 62 Title Metallic nano thin films in-situ and real-time deposition monitoring based on cascade structure of SPR fiber sensor Keyword In-situ and real-time dual dips measurement for surface plasmon resona Ni metallic thickness Optical fiber sensor Optical fiber sensor Ni metallic thickness dual dips measurement for surface plasmon resona In-situ and real-time Abstract We proposed a new cascade structure to produce an optical sensor based on surface plasmon resonance (SPR). We also applied the SPR fiber sensor monitor the thickness of nickel nano thin film under the condition of in-situ deposition . The cascade structure composes of two sensing sections and one coupling section with only one side-polished process. SPR optical fiber sensors have the advantages of low cost, simplicity, high reliability, good sensitivity, and without electromagnetic interference (EMI) on such application.
The monitoring system we proposed in this thesis used a white light source to carry out the measurements, and the transmitted optical SPR respone obtained by an optical spectrum analyser will be recorded in each minute during the nickel thin film deposition. The transmitted optical intensities at the wavelength of 690 and 1000 nm of the SPR spectrum response curve, for several different nickel film thicknesses during the thin film deposition, will also be analysed for the comparison of the sensing sensitivity of the single and cascade structures. The results show that the monitoring sensitivity can be significantly improved 13 times from -5.02×10-4 a.u./nm for the single SPR structure to the -6.52×10-3 a.u./nm for the cascade SPR structure, when the nickel thin film thickness is under 40 nm. And,the monitoring sensitivity can also improved 1.35 times when the thickness of nickel film is thicker than 40 nm.
Advisor Committee Tsai, Woo-Hu - advisor
none - co-chair
none - co-chair
Files Date of Defense 2016-07-25 Date of Submission 2016-08-25