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The defense date of the thesis is 2007-09-05
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URN etd-0905107-110857 Statistics This thesis had been viewed 2844 times. Download 36 times. Author Jun-wei Chen Author's Email Address No Public. Department Electro-Optical Engineering Year 2006 Semester 2 Degree Master Type of Document Master's Thesis Language zh-TW.Big5 Chinese Page Count 104 Title Simulation and fabrication of antireflection coatings for solar cell application Keyword solar cell sputter antireflection antireflection sputter solar cell Abstract Antireflection coatings have been the key of the fabricated silicon solar cells; they can reduce the reflection and increase the light. This study used the Film Star software to simulate the characteristic of the antireflection coatings. Using rf magnetron sputtering deposit SiO2 and Si3N4 film on the silicon substrate, and we will aim at different optical thickness stacking. We wish get the lower reflection at vision region.
The part of single layer ARC, the lowest reflection of SiO2 and Si3N4 is 4.76 % and 0.34 % at λ/4 optical thickness. Their reflection will compare low 74.94 % and 82.04 % with polish silicon wafer. The average reflection of double layer ARC is 8.39 % at λ/4-λ/4 optical thickness, and it will reduce 77.70 %. We wish we can let the antireflection coating combine with the solar cells, and reduce the reflection and increase the efficiency of the solar cells.
Advisor Committee Wen-chin Shih - advisor
none - co-chair
none - co-chair
Files Date of Defense 2007-07-24 Date of Submission 2007-09-05